Ultraviolet Radiation for Phenol Removal from Aqueous Solutions by Copper Oxide Nanoparticles in Advanced Oxidation Process

Document Type : Research Article


Department of Environmental Engineering, College of Engineering, Mustansiriyah University, Baghdad, IRAQ


This study shows the efficient investigated processes of the Advanced Oxidation Process (AOP) (batch and continuous), which has been used for the degradation of the phenol in aqueous solutions by (UV/CuO nanoparticles). The effects of CuO nanoparticles' initial concentration, pH, and irradiation period were investigated in a batch system. The following ideal settings resulted in the maximum removal rate of Phenol from the stock solution (99%): In batch tests, 55 mg/L from CuO nanoparticles as a stimulant, irradiation time  120 min of and at pH 6. The effects of flow rate, number of UV lamps, and reaction time were investigated in a continuous system; the results showed that the efficiency of decomposition decreases as the flow rate of solution in the reactor increases; the maximum removal efficiency of the process (UV/CuO nanoparticles) was 90 % at 20 mL/min and 120 minutes of irradiation time. Copper oxide nanoparticles are useful in general because of their strong Phenol adsorption capability in the presence of UV, as well as the fact that they reduce the amount of Phenol in the stock solution.


Main Subjects

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