TY - JOUR ID - 6935 TI - Nanometer-Scale Patterning on PMMA Resist by Force Microscopy Lithography JO - Iranian Journal of Chemistry and Chemical Engineering JA - IJCCE LA - en SN - 1021-9986 AU - Sadegh Hassani, Sedigheh AU - Sobat, Zahra AU - Aghabozorg, Hamid Reza AD - Catalysis Research Center, Research Institute of Petroleum Industry (RIPI), P.O. Box 18754-4163 Tehran, I.R. IRAN Y1 - 2008 PY - 2008 VL - 27 IS - 4 SP - 29 EP - 34 KW - Nano-lithography KW - Nano-patterning KW - Force lithography KW - Atomic Force Microscopy KW - Scanning probe lithography DO - 10.30492/ijcce.2008.6935 N2 - Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the depth of scratches increases with the increase of applied normal force. The scanning velocity is also shown to influence the AFM patterning process. As the scanning velocity increases, the scratch depth decreases. The influence of time and number of scratching cycles is also investigated.   UR - https://ijcce.ac.ir/article_6935.html L1 - https://ijcce.ac.ir/article_6935_eadb243fa49f4b76d3673d823edb4585.pdf ER -